Single wafer fabrication of a symmetric double-sided beam-mass structure using DRIE and wet etching by a novel vertical sidewall protection technique
- Xiaofeng Zhou
- , Lufeng Che
- , Bin Xiong
- , Kebin Fan
- , Yuelin Wang
- , Zuankai Wang
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
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(Scopus)