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Single wafer fabrication of a symmetric double-sided beam-mass structure using DRIE and wet etching by a novel vertical sidewall protection technique

  • Xiaofeng Zhou
  • , Lufeng Che
  • , Bin Xiong
  • , Kebin Fan
  • , Yuelin Wang
  • , Zuankai Wang

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

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