Abstract
The influence of pressure on surface modification conditions, such as the potential distribution in the plasma sheath, ion motions and dosage, sputtering energy and incident angle in the plasma ion implantation of cavity molds of metal dies, was numerically simulated with the two-dimensional particle-in-cell/Monte Carlo collision model. The simulated results show that the pressure plays a key role in the ion implantation. As the pressure rises up, the sheath thickness above the inner surfaces of the cavity mold decreases, and the beam density and average energy of the impinging ions at the top and bottom decrease, whereas on the sides they first increase, then, decrease. We suggest that the controlled variations in pressure may improve the uniformity of both the implantation dosage and energy, possibly because of particle collisions.
| Original language | English |
|---|---|
| Pages (from-to) | 608-613 |
| Journal | Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology |
| Volume | 30 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - Dec 2010 |
Bibliographical note
Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].Research Keywords
- Implantation energy
- Particle simulation
- Plasma ion implantation
- Pressure
- Uniformity
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