Abstract
We demonstrate three methods for the fabrication of large scale ordered silicon nanorwires arrays using reactive ion etching (RIE) or metal-assisted chemical etching though colloidal lithography or anodic aluminum oxide (AAO) templates. Si NWAs with desirable diameters could be obtained by shrinking the sizes of colloidal lithography or the pore sizes of AAO templates. The reflection can be eliminated effectively over broadband regions by controlled NWAs; i.e., the wavelength-averaged total reflectance is decreased to 10.0 % at the wavelengths of 200-850 nm. The resulting nanostructures might have great potential applications in photovoltaics.
| Original language | English |
|---|---|
| Title of host publication | International Photonics and Optoelectronics Meetings (POEM) |
| Publisher | OSA publishing |
| ISBN (Print) | 978-1-55752-976-3 |
| DOIs | |
| Publication status | Published - May 2013 |
| Externally published | Yes |
| Event | Nanophotonics, Nanoelectronics and Nanosensor, N3 2013 - Wuhan, China Duration: 25 May 2013 → 26 May 2013 |
Publication series
| Name | Nanophotonics, Nanoelectronics and Nanosensor, N3 |
|---|
Conference
| Conference | Nanophotonics, Nanoelectronics and Nanosensor, N3 2013 |
|---|---|
| Place | China |
| City | Wuhan |
| Period | 25/05/13 → 26/05/13 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
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