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Simulation and experiment of light trapping ability of periodic si nanowires

  • Hsin-Ping Wang
  • , Kun-Tong Tsai
  • , Kun-Yu Lai
  • , Yi-Ruei Lin
  • , Yuh-Lin Wang
  • , Jr-Hau He*
  • *Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

Abstract

We demonstrate three methods for the fabrication of large scale ordered silicon nanorwires arrays using reactive ion etching (RIE) or metal-assisted chemical etching though colloidal lithography or anodic aluminum oxide (AAO) templates. Si NWAs with desirable diameters could be obtained by shrinking the sizes of colloidal lithography or the pore sizes of AAO templates. The reflection can be eliminated effectively over broadband regions by controlled NWAs; i.e., the wavelength-averaged total reflectance is decreased to 10.0 % at the wavelengths of 200-850 nm. The resulting nanostructures might have great potential applications in photovoltaics.
Original languageEnglish
Title of host publicationInternational Photonics and Optoelectronics Meetings (POEM)
PublisherOSA publishing
ISBN (Print)978-1-55752-976-3
DOIs
Publication statusPublished - May 2013
Externally publishedYes
EventNanophotonics, Nanoelectronics and Nanosensor, N3 2013 - Wuhan, China
Duration: 25 May 201326 May 2013

Publication series

NameNanophotonics, Nanoelectronics and Nanosensor, N3

Conference

ConferenceNanophotonics, Nanoelectronics and Nanosensor, N3 2013
PlaceChina
CityWuhan
Period25/05/1326/05/13

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

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