TY - JOUR
T1 - Silicide films for archival optical storage
AU - Tu, K. N.
AU - Ahn, K. Y.
AU - Herd, S. R.
N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].
PY - 1981
Y1 - 1981
N2 - We demonstrate here that bilayer films consisting of Si and transition metals with a layer thickness of 15-40 nm are promising materials for archival optical storage. They show a large optical reflectivity change before and after silicide formation, have a long lifetime at room temperature, and are nontoxic.
AB - We demonstrate here that bilayer films consisting of Si and transition metals with a layer thickness of 15-40 nm are promising materials for archival optical storage. They show a large optical reflectivity change before and after silicide formation, have a long lifetime at room temperature, and are nontoxic.
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U2 - 10.1063/1.92609
DO - 10.1063/1.92609
M3 - RGC 21 - Publication in refereed journal
SN - 0003-6951
VL - 39
SP - 927
EP - 929
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 11
ER -