Silicide films for archival optical storage

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

12 Scopus Citations
View graph of relations

Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)927-929
Journal / PublicationApplied Physics Letters
Volume39
Issue number11
Publication statusPublished - 1981
Externally publishedYes

Abstract

We demonstrate here that bilayer films consisting of Si and transition metals with a layer thickness of 15-40 nm are promising materials for archival optical storage. They show a large optical reflectivity change before and after silicide formation, have a long lifetime at room temperature, and are nontoxic.

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.

Citation Format(s)

Silicide films for archival optical storage. / Tu, K. N.; Ahn, K. Y.; Herd, S. R.

In: Applied Physics Letters, Vol. 39, No. 11, 1981, p. 927-929.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review