Side-Gated In2O3 Nanowire Ferroelectric FETs for High-Performance Nonvolatile Memory Applications
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Article number | 1600078 |
Journal / Publication | Advanced Science |
Volume | 3 |
Issue number | 9 |
Publication status | Published - 1 Sept 2016 |
Link(s)
DOI | DOI |
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Attachment(s) | Documents
Publisher's Copyright Statement
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Link to Scopus | https://www.scopus.com/record/display.uri?eid=2-s2.0-84985972763&origin=recordpage |
Permanent Link | https://scholars.cityu.edu.hk/en/publications/publication(2b190f29-46ea-45c9-be1e-f5b9bf896872).html |
Research Area(s)
- ferroelectric memory, field-effect transistors, In2O3 nanowires, P(VDF-TrFE), side-gated
Citation Format(s)
Side-Gated In2O3 Nanowire Ferroelectric FETs for High-Performance Nonvolatile Memory Applications. / Su, Meng; Yang, Zhenyu; Liao, Lei et al.
In: Advanced Science, Vol. 3, No. 9, 1600078, 01.09.2016.
In: Advanced Science, Vol. 3, No. 9, 1600078, 01.09.2016.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
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