Short-range order in non-stoichiometric amorphous silicon oxynitride and silicon-rich nitride

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • V. A. Gritsenko
  • R. W M Kwok
  • Hei Wong
  • J. B. Xu

Related Research Unit(s)

Detail(s)

Original languageEnglish
Pages (from-to)96-101
Journal / PublicationJournal of Non-Crystalline Solids
Volume297
Issue number1
Publication statusPublished - Jan 2002

Abstract

By de-convoluting the Si 2p X-ray photoelectronic spectra, it was found that the short-range order in amorphous silicon oxynitride (SiOxNy) films with different compositions can be quantitatively described by the random bonding model. In this model the SiOxNy consists of five types of randomly distributed tetrahedra and it indicates that metal-oxide-semiconductor transistor with this gate dielectric will not result in any gigantic potential fluctuation in the conduction channel. On the contrary, the structure of silicon-rich silicon nitride SiNx can only be described by the random mixture model where the local composition fluctuations in this film will result in gigantic potential contra-variant fluctuation. © 2002 Elsevier Science B.V. All rights reserved.

Citation Format(s)

Short-range order in non-stoichiometric amorphous silicon oxynitride and silicon-rich nitride. / Gritsenko, V. A.; Kwok, R. W M; Wong, Hei et al.
In: Journal of Non-Crystalline Solids, Vol. 297, No. 1, 01.2002, p. 96-101.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review