Sheath Expansion Dynamics during Plasma Implantation of Insulating Materials

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journal

1 Scopus Citations
View graph of relations



Original languageEnglish
Journal / PublicationIEEE International Conference on Plasma Science
Publication statusPublished - 2003


Title2003 IEEE International Conference on Plasma Science
PlaceKorea, Republic of
Period2 - 5 June 2003


Plasma immersion ion implantation (PHI) of insulating materials is complicated, in spite of practical important with regard to basic research, process development, as well as industrial applications. The capacitance induced by the insulating sample decreases the bombardment energy of the incident ions. The plasma sheath is subsequently deformed due to different surface potential when the sample and target holder is integrated and treated as one entity. Consequently, nonuniformity of the incident dose and low implant dose result. In this work, the plasma sheath formation and propagation are investigated during plasma implantation of insulating polymeric films. A movable probe is used in the experiments and the collected electron current is monitored to determine the time-dependent and space-dependent plasma-sheath dynamics. Two-dimensional numerical simulation is also employed to study the phenomenon. The geometrical configuration and physical properties of the samples are observed to have a critical influence on the plasma sheath dynamics. Our experimental and theoretical results and related mechanism are discussed.