Self-sealing SiO2 pores on silicon formed by oxidation of microporous silicon

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalNot applicablepeer-review

1 Scopus Citations
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Author(s)

  • Changyong Zhan
  • Yu Zou
  • Jianchun Wu
  • Ding Ren
  • Bo Liu
  • Kaifu Huo
  • Ningkang Huang

Detail(s)

Original languageEnglish
Pages (from-to)10-13
Journal / PublicationMicroporous and Mesoporous Materials
Volume174
Publication statusPublished - 2013

Abstract

Self-sealing silicon pores with size of 140-160 nm are formed by electrochemical etching. The microporous silicon (MPS) covers the openings and side walls of straight silicon pores (SSPs). The self-sealing SiO2 pores with diameters of 195-205 nm are fabricated from the self-sealing SSPs in an aqueous alkaline medium containing magnesium via oxidation of MPS. The thicknesses of the surface layers covering the SSPs and SiO2 pores are 200 nm and 140 nm, respectively, and the depth of the pores is more than 60 μm. The SiO2 making up the sub-micron pores has a nanoporous structure which allows water and hydrogen molecules to pass through in an aqueous solution. © 2013 Elsevier B.V. All rights reserved.

Research Area(s)

  • Ion beam sputtering, Magnesium, Microporous silicon, Silicon dioxide pores, Silicon pores

Citation Format(s)

Self-sealing SiO2 pores on silicon formed by oxidation of microporous silicon. / Zhan, Changyong; Zou, Yu; Wu, Jianchun; Ren, Ding; Liu, Bo; Huo, Kaifu; Huang, Ningkang; Chu, Paul K.

In: Microporous and Mesoporous Materials, Vol. 174, 2013, p. 10-13.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalNot applicablepeer-review