Self-propagating explosive reactions in Al/Ni multilayer thin films

E. Ma; C. V. Thompson; L. A. Clevenger; K. N. Tu

doi:10.1063/1.103504

Self-propagating explosive reactions in Al/Ni multilayer thin films

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Overview

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Author(s)

E. Ma
C. V. Thompson
L. A. Clevenger
K. N. Tu

Detail(s)

Original language	English
Pages (from-to)	1262-1264
Journal / Publication	Applied Physics Letters
Volume	57
Issue number	12
Publication status	Published - 1990
Externally published	Yes

Link(s)

DOI	DOI https://doi.org/10.1063/1.103504 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0000844106&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(bec49f95-e901-4c3e-b4a4-6a2f78d4deee).html

Abstract

Self-propagating explosive reactions, with a reaction front speed of about 4 m/s, have been observed in free-standing polycrystalline Al/Ni multilayer thin films. The resultant phases and microstructures are compared with those obtained by conventional thermal annealing. We show evidence which indicates that melting occurred in the explosive reactions of films with an atomic concentration ratio of 3Al:1Ni. It is also observed that the propensity of multilayer films to undergo explosive reactions is dependent on the modulation length of the film as well as on the ambient temperature. These observations are interpreted with a simple model based on the rate balance between the rates of heat generation and heat dissipation.

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