Abstract
We have carried out some ion implantation experiments into conducting and insulating substrates with a metal ion beam produced by a vacuum arc ion source. We show that the broad ion beam produced by this implanter configuration is space-charge neutralized to a high degree, allowing ion implantation of insulating materials without complication due to charge build-up. The implantation is in effect self-neutralized, with the ion beam carrying along its own cold electron flood. Published by Elsevier Science B.V.
| Original language | English |
|---|---|
| Pages (from-to) | 188-192 |
| Journal | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
| Volume | 132 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1 Oct 1997 |
| Externally published | Yes |
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