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Self-neutralized ion implantation into insulators

  • F. Liu
  • , O. R. Monteiro
  • , K. M. Yu
  • , I. G. Brown*
  • *Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

We have carried out some ion implantation experiments into conducting and insulating substrates with a metal ion beam produced by a vacuum arc ion source. We show that the broad ion beam produced by this implanter configuration is space-charge neutralized to a high degree, allowing ion implantation of insulating materials without complication due to charge build-up. The implantation is in effect self-neutralized, with the ion beam carrying along its own cold electron flood. Published by Elsevier Science B.V.
Original languageEnglish
Pages (from-to)188-192
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume132
Issue number1
DOIs
Publication statusPublished - 1 Oct 1997
Externally publishedYes

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