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Selective growth of Pb islands on graphene/SiC buffer layers

X. T. Liu, T. W. Hu, Y. P. Miao, D. Y. Ma, Paul K. Chu, F. Ma*, K. W. Xu*

*Corresponding author for this work

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    36 Downloads (CityUHK Scholars)

    Abstract

    Graphene is fabricated by thermal decomposition of silicon carbide (SiC) and Pb islands are deposited by Pb flux in molecular beam epitaxy chamber. It is found that graphene domains and SiC buffer layer coexist. Selective growth of Pb islands on SiC buffer layer rather than on graphene domains is observed. It can be ascribed to the higher adsorption energy of Pb atoms on the 63 reconstruction of SiC. However, once Pb islands nucleate on graphene domains, they will grow very large owing to the lower diffusion barrier of Pb atoms on graphene. The results are consistent with first-principle calculations. Since Pb atoms on graphene are nearly free-standing, Pb islands grow in even-number mode.
    Original languageEnglish
    Article number65304
    JournalJournal of Applied Physics
    Volume117
    Issue number6
    Online published10 Feb 2015
    DOIs
    Publication statusPublished - 14 Feb 2015

    Publisher's Copyright Statement

    • COPYRIGHT TERMS OF DEPOSITED FINAL PUBLISHED VERSION FILE: This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in X. T. Liu, T. W. Hu, Y. P. Miao, D. Y. Ma, Paul K. Chu, F. Ma, and K. W. Xu , "Selective growth of Pb islands on graphene/SiC buffer layers", Journal of Applied Physics 117, 065304 (2015) and may be found at https://doi.org/10.1063/1.4908013.

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