Selective Chemical Vapor Deposition Growth of WS2/MoS2 Vertical and Lateral Heterostructures on Gold Foils

Zixuan Wang, Wenshuo Xu*, Benxuan Li, Qiaoyan Hao, Di Wu, Dianyu Qi, Haibo Gan, Junpeng Xie, Guo Hong*, Wenjing Zhang*

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

4 Citations (Scopus)
48 Downloads (CityUHK Scholars)

Abstract

Vertical and lateral heterostructures consisting of atomically layered two-dimensional (2D) materials exhibit intriguing properties, such as efficient charge/energy transfer, high photoresponsivity, and enhanced photocatalytic activities. However, the controlled fabrication of vertical or lateral heterojunctions on metal substrates remains challenging. Herein, we report a facile and controllable method for selective growth of WS2/MoS2 vertical or lateral heterojunctions on polycrystalline gold (Au) foil by tuning the gas flow rate of hydrogen (H2). We find that lateral growth is favored without H2, whereas vertical growth mode can be switched on by introducing 8–10 sccm H2. In addition, the areal coverage of the WS2/MoS2 vertical heterostructures is tunable in the range of 12–25%. Transmission electron microscopy (TEM) and selected area electron diffraction (SAED) results demonstrate the quality and absence of cross-contamination of the as-grown heterostructures. Furthermore, we investigate the effects of the H2 flow rate on the morphology of the heterostructures. These pave the way to develop unprecedented 2D heterostructures towards applications in (opto)electronic devices. © 2022 by the authors. Licensee MDPI, Basel, Switzerland.
Original languageEnglish
Article number1696
JournalNanomaterials
Volume12
Issue number10
Online published16 May 2022
DOIs
Publication statusPublished - May 2022
Externally publishedYes

Research Keywords

  • 2D materials
  • chemical vapor deposition
  • heterostructures
  • selective growth

Publisher's Copyright Statement

  • This full text is made available under CC-BY 4.0. https://creativecommons.org/licenses/by/4.0/

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