Schottky-barrier height of iridium silicide

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • I. Ohdomari
  • K. N. Tu
  • F. M. D'Heurle
  • T. S. Kuan
  • S. Petersson

Detail(s)

Original languageEnglish
Pages (from-to)1028-1030
Journal / PublicationApplied Physics Letters
Volume33
Issue number12
Publication statusPublished - 1978
Externally publishedYes

Abstract

Iridium silicides have been prepared by annealing Ir films on (100) - and (111) -oriented Si from 300 to 500°C. Phase identification was performed by both x-ray and electron diffractions, and Schottky-barrier height by current-voltage measurements. The silicide IrSi has been found to have a barrier height of 0.93 eV, which is the highest among all the silicides measured. The high value leads us to conclude that the silicide does not follow the linear relation which exists between barrier height and heat of formation of most other silicides.

Bibliographic Note

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Citation Format(s)

Schottky-barrier height of iridium silicide. / Ohdomari, I.; Tu, K. N.; D'Heurle, F. M.; Kuan, T. S.; Petersson, S.

In: Applied Physics Letters, Vol. 33, No. 12, 1978, p. 1028-1030.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review