Running droplet of interfacial chemical reaction flow

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Hao Zhang
  • Bai Yang
  • Lei Jiang

Detail(s)

Original languageEnglish
Pages (from-to)5988-5991
Journal / PublicationSoft Matter
Volume8
Issue number22
Publication statusPublished - 14 Jun 2012
Externally publishedYes

Abstract

Hydrofluoric acid (HF) etching of a silicon surface is demonstrated as an efficient means to create an interfacial chemical reaction flow, thus leading to self-propelled water-droplet motion. Before and after HF etching, the silicon surface exhibits a significant free energy change, represented by the increase of water contact angle from 0 to 60°. This favors self-propelled HF droplet motion with high-speed and long-distance, and in particular enables uphill motion. Even for a HF droplet 10 microliters in volume, vertical climbing along silicon strips is permitted. By investigating the temperature-dependent motion velocity, it confirms that the velocity is in positive proportion to the HF reaction rate. © 2012 The Royal Society of Chemistry.

Citation Format(s)

Running droplet of interfacial chemical reaction flow. / Yao, Xi; Bai, Hao; Ju, Jie; Zhou, Ding; Li, Jing; Zhang, Hao; Yang, Bai; Jiang, Lei.

In: Soft Matter, Vol. 8, No. 22, 14.06.2012, p. 5988-5991.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review