Roughening kinetics of thin films in the presence of both stress and Ehrlich-Schwobel barrier

Z. J. Liu; Y. G. Shen

doi:10.1063/1.1637448

Roughening kinetics of thin films in the presence of both stress and Ehrlich-Schwobel barrier

Z. J. Liu, Y. G. Shen

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

13 Citations (Scopus)

Abstract

The use of a linear continuum model to investigate the growth of thin films in the presence of Ehrlich-Schwobel barrier (ESB) and stress was analyzed. It was observed that the roughening kinetics of the system was dependent on the growth temperature. The ESB dominated the surface growth at low temperatures. At low temperatures, the morphology instability was controlled by the stress. The surface roughness was found dependent on the growth time at the early stages of growth and at the last stages of growth, unstable growth was obtained because of enhanced stress and ESB effects.

Original language	English
Pages (from-to)	5404-5406
Journal	Applied Physics Letters
Volume	83
Issue number	26
DOIs	https://doi.org/10.1063/1.1637448
Publication status	Published - 29 Dec 2003

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@article{cfc4748b846941539ca73576d08b1c75,

title = "Roughening kinetics of thin films in the presence of both stress and Ehrlich-Schwobel barrier",

abstract = "The use of a linear continuum model to investigate the growth of thin films in the presence of Ehrlich-Schwobel barrier (ESB) and stress was analyzed. It was observed that the roughening kinetics of the system was dependent on the growth temperature. The ESB dominated the surface growth at low temperatures. At low temperatures, the morphology instability was controlled by the stress. The surface roughness was found dependent on the growth time at the early stages of growth and at the last stages of growth, unstable growth was obtained because of enhanced stress and ESB effects.",

author = "Liu, {Z. J.} and Shen, {Y. G.}",

year = "2003",

month = dec,

day = "29",

doi = "10.1063/1.1637448",

language = "English",

volume = "83",

pages = "5404--5406",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "26",

}

TY - JOUR

T1 - Roughening kinetics of thin films in the presence of both stress and Ehrlich-Schwobel barrier

AU - Liu, Z. J.

AU - Shen, Y. G.

PY - 2003/12/29

Y1 - 2003/12/29

N2 - The use of a linear continuum model to investigate the growth of thin films in the presence of Ehrlich-Schwobel barrier (ESB) and stress was analyzed. It was observed that the roughening kinetics of the system was dependent on the growth temperature. The ESB dominated the surface growth at low temperatures. At low temperatures, the morphology instability was controlled by the stress. The surface roughness was found dependent on the growth time at the early stages of growth and at the last stages of growth, unstable growth was obtained because of enhanced stress and ESB effects.

AB - The use of a linear continuum model to investigate the growth of thin films in the presence of Ehrlich-Schwobel barrier (ESB) and stress was analyzed. It was observed that the roughening kinetics of the system was dependent on the growth temperature. The ESB dominated the surface growth at low temperatures. At low temperatures, the morphology instability was controlled by the stress. The surface roughness was found dependent on the growth time at the early stages of growth and at the last stages of growth, unstable growth was obtained because of enhanced stress and ESB effects.

UR - http://www.scopus.com/inward/record.url?scp=0942288655&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0942288655&origin=recordpage

U2 - 10.1063/1.1637448

DO - 10.1063/1.1637448

M3 - RGC 21 - Publication in refereed journal

SN - 0003-6951

VL - 83

SP - 5404

EP - 5406

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 26

ER -

Roughening kinetics of thin films in the presence of both stress and Ehrlich-Schwobel barrier

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