Roughening kinetics of reactively sputter-deposited Ti-Al-N films on Si(100)

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

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Material Science

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Film Material Science
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Surface Roughness Material Science
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Microscopy Material Science
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Surface (Surface Sc... Material Science
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Sputter Deposition Material Science
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Surface Diffusion Material Science
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Magnetron Sputterin... Material Science
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Surface Topography Material Science

Keyphrases

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Si(111) Keyphrases
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Sputter-deposited Keyphrases
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Ti1-xAlxN Keyphrases
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TiAlN Film Keyphrases
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Al Concentration Keyphrases
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Correlation Length Keyphrases
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Sputter Deposition Keyphrases
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Atomic Force Micros... Keyphrases
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DC Reactive Magnetr... Keyphrases
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Film Surface Keyphrases
50
Si (100) Substrate Keyphrases
50
Surface Diffusion Keyphrases
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Surface Topography Keyphrases
50
Height Correction Keyphrases
50
Correction Function Keyphrases
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Roughness Exponent Keyphrases
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Atomic Force Micros... Keyphrases
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Surface Roughening Keyphrases
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Root-mean-square Ro... Keyphrases
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Vertical Root Keyphrases

INIS

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films INIS
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surfaces INIS
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kinetics INIS
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sputtering INIS
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roughness INIS
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atomic force micros... INIS
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height INIS
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concentration INIS
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substrates INIS
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length INIS
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competition INIS
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diffusion INIS
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deposition INIS
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correlations INIS
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roots INIS
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images INIS
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corrections INIS
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magnetrons INIS
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instability INIS
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topography INIS

Engineering

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Surface Engineering
100
Atomic Force Micros... Engineering
50
Root Mean Square Engineering
50
Magnetron Engineering
50
Roughness Engineering
50
Correlation Length Engineering
50
Square Roughness Engineering
50
Surface Topography Engineering
50
Film Surface Engineering
50
Quantification Engineering
50
Images Engineering
50
Substrates Engineering
Research OutputsResearch Output authored by Roughening kinetics of reactively sputter-deposited Ti-Al-N films on Si(100) is tagged with the concept