Room-temperature oxidation of Ni, Pd, and Pt silicides
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
| Original language | English |
|---|---|
| Pages (from-to) | 2253-2257 |
| Journal / Publication | Journal of Applied Physics |
| Volume | 57 |
| Issue number | 6 |
| Publication status | Published - 1985 |
| Externally published | Yes |
Link(s)
Abstract
The room-temperature oxidation of Ni, Pd, and Pt silicides has been studied using electron spectroscopy for chemical analysis. It has been found that (1) Si atoms oxidize predominantly, (2) the oxidation of Si is enhanced in the metal-rich silicides, and (3) the growth of the surface oxide layer leaves behind a phase enriched with metal.
Bibliographic Note
Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.
Citation Format(s)
Room-temperature oxidation of Ni, Pd, and Pt silicides. / Cros, A.; Pollak, R. A.; Tu, K. N.
In: Journal of Applied Physics, Vol. 57, No. 6, 1985, p. 2253-2257.
In: Journal of Applied Physics, Vol. 57, No. 6, 1985, p. 2253-2257.
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
