Role of hydrogen in doping mechanism for a-Si : H alloys

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Detail(s)

Original languageEnglish
Pages (from-to)1625-1627
Journal / PublicationSolid State Communications
Volume65
Issue number12
Publication statusPublished - Mar 1988
Externally publishedYes

Abstract

Calculations of electronic energies for structural clusters simulating phosphorus and boron substitutional doped and undoped pure and hydrogenated silicon have been performed using CNDO/2 quantum chemical molecular orbital method, respectively. The results show that more energies for implanting impurities are required in hydrogenated Si cluster than that in pure Si cluster, and a band of shallow gap states is induced by the substitutional doping in the hydrogenated system. From the results it is concluded that the hydrogenation is a key factor of efficient substitutional doping in the a-Si:H alloys. © 1988.

Citation Format(s)

Role of hydrogen in doping mechanism for a-Si : H alloys. / Rui-qin Zhang, Ruiqin; Guo-cai Dai, [Unknown]; Zheng-ting Cai, [Unknown] et al.

In: Solid State Communications, Vol. 65, No. 12, 03.1988, p. 1625-1627.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review