Role of fluorine in plasma nitridated ZrO2 thin films under irradiation

A. P. Huang; Z. S. Xiao; X. Y. Liu; L. Wang; Paul K. Chu

doi:10.1063/1.2991445

Role of fluorine in plasma nitridated ZrO₂ thin films under irradiation

A. P. Huang
, Z. S. Xiao
, X. Y. Liu
, L. Wang
, Paul K. Chu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

2 Citations (Scopus)

Abstract

The role of fluorine in plasma-nitridated ZrO₂ thin films under electron irradiation is investigated in situ by real-time high-resolution transmission electron microscopy. Fluorine and nitrogen codoping can suppress the microstructure evolution during electron beam bombardment and the corresponding origin is probed and verified. The results obtained by irradiation with an ultraviolet laser show that plasma fluorination can effectively remove the dissociative N or O particles in the ZrO₂ thin films which can escape from the interstitial sites under electron irradiation. The mechanism of the irradiation stability of the F and N codoped ZrO₂ thin film is also discussed. © 2008 American Institute of Physics.

Original language	English
Article number	122907
Journal	Applied Physics Letters
Volume	93
Issue number	12
DOIs	https://doi.org/10.1063/1.2991445
Publication status	Published - 2008

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@article{5172f7a7fc5f4b56bf25307f0c569bf9,

title = "Role of fluorine in plasma nitridated ZrO2 thin films under irradiation",

abstract = "The role of fluorine in plasma-nitridated ZrO2 thin films under electron irradiation is investigated in situ by real-time high-resolution transmission electron microscopy. Fluorine and nitrogen codoping can suppress the microstructure evolution during electron beam bombardment and the corresponding origin is probed and verified. The results obtained by irradiation with an ultraviolet laser show that plasma fluorination can effectively remove the dissociative N or O particles in the ZrO2 thin films which can escape from the interstitial sites under electron irradiation. The mechanism of the irradiation stability of the F and N codoped ZrO2 thin film is also discussed. {\textcopyright} 2008 American Institute of Physics.",

author = "Huang, \{A. P.\} and Xiao, \{Z. S.\} and Liu, \{X. Y.\} and L. Wang and Chu, \{Paul K.\}",

year = "2008",

doi = "10.1063/1.2991445",

language = "English",

volume = "93",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "12",

}

TY - JOUR

T1 - Role of fluorine in plasma nitridated ZrO2 thin films under irradiation

AU - Huang, A. P.

AU - Xiao, Z. S.

AU - Liu, X. Y.

AU - Wang, L.

AU - Chu, Paul K.

PY - 2008

Y1 - 2008

N2 - The role of fluorine in plasma-nitridated ZrO2 thin films under electron irradiation is investigated in situ by real-time high-resolution transmission electron microscopy. Fluorine and nitrogen codoping can suppress the microstructure evolution during electron beam bombardment and the corresponding origin is probed and verified. The results obtained by irradiation with an ultraviolet laser show that plasma fluorination can effectively remove the dissociative N or O particles in the ZrO2 thin films which can escape from the interstitial sites under electron irradiation. The mechanism of the irradiation stability of the F and N codoped ZrO2 thin film is also discussed. © 2008 American Institute of Physics.

AB - The role of fluorine in plasma-nitridated ZrO2 thin films under electron irradiation is investigated in situ by real-time high-resolution transmission electron microscopy. Fluorine and nitrogen codoping can suppress the microstructure evolution during electron beam bombardment and the corresponding origin is probed and verified. The results obtained by irradiation with an ultraviolet laser show that plasma fluorination can effectively remove the dissociative N or O particles in the ZrO2 thin films which can escape from the interstitial sites under electron irradiation. The mechanism of the irradiation stability of the F and N codoped ZrO2 thin film is also discussed. © 2008 American Institute of Physics.

UR - https://www.scopus.com/pages/publications/52949083903

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-52949083903&origin=recordpage

U2 - 10.1063/1.2991445

DO - 10.1063/1.2991445

M3 - RGC 21 - Publication in refereed journal

SN - 0003-6951

VL - 93

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 12

M1 - 122907

ER -