Reversible nano-lithography for commercial approaches

Jae Hong Park; Hyun Ik Jang; Woo Choong Kim; Hae Su Yun; Jun Yong Park; Seok Woo Jeon; Hee Yeoun Kim; Chi Won Ahn

doi:10.1117/12.2205065

Reversible nano-lithography for commercial approaches

Jae Hong Park^*
, Hyun Ik Jang
, Woo Choong Kim
, Hae Su Yun
, Jun Yong Park
, Seok Woo Jeon
, Hee Yeoun Kim
, Chi Won Ahn

^*Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Abstract

The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro-or nano-scale sensors and actuators.

Original language	English
Title of host publication	Alternative Lithographic Technologies VIII
Editors	Christopher Bencher, Joy Y. Cheng
Publisher	SPIE
ISBN (Print)	9781510600126
DOIs	https://doi.org/10.1117/12.2205065
Publication status	Published - Feb 2016
Externally published	Yes
Event	Alternative Lithographic Technologies VIII - San Jose, United States Duration: 22 Feb 2016 → 25 Feb 2016

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	9777
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Alternative Lithographic Technologies VIII
Place	United States
City	San Jose
Period	22/02/16 → 25/02/16

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

Research Keywords

Commercialization
Imprinting
Lithography
Molding
Nano Patterning
Nano Structure
Soft

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10.1117/12.2205065

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Park, J. H., Jang, H. I., Kim, W. C., Yun, H. S., Park, J. Y., Jeon, S. W., Kim, H. Y., & Ahn, C. W. (2016). Reversible nano-lithography for commercial approaches. In C. Bencher, & J. Y. Cheng (Eds.), Alternative Lithographic Technologies VIII Article 977723 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9777). SPIE. https://doi.org/10.1117/12.2205065

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title = "Reversible nano-lithography for commercial approaches",

abstract = "The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro-or nano-scale sensors and actuators.",

keywords = "Commercialization, Imprinting, Lithography, Molding, Nano Patterning, Nano Structure, Soft",

author = "Park, \{Jae Hong\} and Jang, \{Hyun Ik\} and Kim, \{Woo Choong\} and Yun, \{Hae Su\} and Park, \{Jun Yong\} and Jeon, \{Seok Woo\} and Kim, \{Hee Yeoun\} and Ahn, \{Chi Won\}",

year = "2016",

month = feb,

doi = "10.1117/12.2205065",

language = "English",

isbn = "9781510600126",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "Christopher Bencher and Cheng, \{Joy Y.\}",

booktitle = "Alternative Lithographic Technologies VIII",

address = "United States",

note = "Alternative Lithographic Technologies VIII ; Conference date: 22-02-2016 Through 25-02-2016",

}

Park, JH, Jang, HI, Kim, WC, Yun, HS, Park, JY, Jeon, SW, Kim, HY & Ahn, CW 2016, Reversible nano-lithography for commercial approaches. in C Bencher & JY Cheng (eds), Alternative Lithographic Technologies VIII., 977723, Proceedings of SPIE - The International Society for Optical Engineering, vol. 9777, SPIE, Alternative Lithographic Technologies VIII, San Jose, California, United States, 22/02/16. https://doi.org/10.1117/12.2205065

Reversible nano-lithography for commercial approaches. / Park, Jae Hong; Jang, Hyun Ik; Kim, Woo Choong et al.
Alternative Lithographic Technologies VIII. ed. / Christopher Bencher; Joy Y. Cheng. SPIE, 2016. 977723 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9777).

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

TY - GEN

T1 - Reversible nano-lithography for commercial approaches

AU - Park, Jae Hong

AU - Jang, Hyun Ik

AU - Kim, Woo Choong

AU - Yun, Hae Su

AU - Park, Jun Yong

AU - Jeon, Seok Woo

AU - Kim, Hee Yeoun

AU - Ahn, Chi Won

PY - 2016/2

Y1 - 2016/2

N2 - The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro-or nano-scale sensors and actuators.

AB - The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro-or nano-scale sensors and actuators.

KW - Commercialization

KW - Imprinting

KW - Lithography

KW - Molding

KW - Nano Patterning

KW - Nano Structure

KW - Soft

UR - https://www.scopus.com/pages/publications/84981516858

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U2 - 10.1117/12.2205065

DO - 10.1117/12.2205065

M3 - RGC 32 - Refereed conference paper (with host publication)

SN - 9781510600126

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Alternative Lithographic Technologies VIII

A2 - Bencher, Christopher

A2 - Cheng, Joy Y.

PB - SPIE

T2 - Alternative Lithographic Technologies VIII

Y2 - 22 February 2016 through 25 February 2016

ER -

Reversible nano-lithography for commercial approaches

Abstract

Publication series

Conference

UN SDGs

Research Keywords

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