Removal character of vertical jet polishing with eccentric rotation motion using magnetorheological fluid
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 1532-1537 |
Journal / Publication | Journal of Materials Processing Technology |
Volume | 213 |
Issue number | 9 |
Online published | 2 Apr 2013 |
Publication status | Published - Sep 2013 |
Link(s)
Abstract
The Gaussian-like removal character having its peak value in the middle is appropriate for excellent imaging quality in optical iterative manufacture. A similar removal curve of magnetorheological jet polishing was explored by using a novel polishing tool with eccentric rotation motion. As a result, the removal model with eccentric rotation motion was established based on the normal fluid impact dynamics theory, and the new-model-based removal characters with different eccentric distances were simulated. In addition, tending gene was put forward to estimate the optimal eccentric distance, with which the profile of the removal distribution approximates Gaussian character mostly. Experiments were conducted to verify the theoretical model on the K9 optical mirror with different eccentric distances using a novel setup. The polishing results indicated that the experiment value was consistent with the theoretical value. All these results have proved that the optimized model is successful and suitable for high precision polishing of complex surfaces. © 2013 Elsevier B.V.
Research Area(s)
- Eccentric distance, Magnetorheological jet polishing, Removal character, Tending gene
Citation Format(s)
Removal character of vertical jet polishing with eccentric rotation motion using magnetorheological fluid. / Wang, Tan; Cheng, Hao-Bo; Dong, Zhi-Chao et al.
In: Journal of Materials Processing Technology, Vol. 213, No. 9, 09.2013, p. 1532-1537.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review