Abstract
Refractive index profile in photorefractive-damage-resistant near-stoichiometric (NS) single-mode Ti:Mg:Er: LiNbO 3 strip waveguide is constructed from the measured mode field distribution. Like the conventional congruent Ti:LiNbO 3 waveguide, the Ti-induced refractive index increase in the NS waveguide studied here follows a sum of two error functions in the width direction and a Gaussian function in the depth direction. Based upon the established index profile model, the mode sizes were calculated using the variational method and compared with the experimental results. The Ti-induced index increment at the NS waveguide surface was also evaluated according to the empirical relation previously reported for the conventional congruent Ti: LiNbO 3 waveguide and compared with the data deduced from the mode field distribution. All comparisons show good agreement, showing that the index model proposed is close to the practical scenario. © 2009-2012 IEEE.
| Original language | English |
|---|---|
| Article number | 6297432 |
| Pages (from-to) | 1823-1830 |
| Journal | IEEE Photonics Journal |
| Volume | 4 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 2012 |
Research Keywords
- mode field distribution
- Near-stoichiometric (NS) Ti:Mg:Er:LiNbO 3 waveguide
- refractive index profile
- variational method
Publisher's Copyright Statement
- COPYRIGHT TERMS OF DEPOSITED FINAL PUBLISHED VERSION FILE: © 2012 IEEE. Translations and content mining are permitted for academic research only. Personal use is also permitted, but republication/redistribution requires IEEE permission. See http://www.ieee.org/publications_standards/publications/rights/index.html for more information.
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