Reducing surface defects of CrxOy film in mid-frequency dual-magnetron sputtering

Xiang Yu; Lei Ma; Yang Liu; Zhongzhou Yang; Meng Hua

doi:10.4028/www.scientific.net/AMR.291-294.219

Reducing surface defects of Cr_xO_y film in mid-frequency dual-magnetron sputtering

Xiang Yu
, Lei Ma
, Yang Liu
, Zhongzhou Yang
, Meng Hua

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Abstract

Influence of the process parameters of a reactive mid-frequency dual-magnetron sputtering on surface defects of Cr_xO_y film was investigated. The forming mechanisms of the observed droplets and craters were analyzed. The optimal parameter combination for accomplishing fewer surface defects was explored; and the optimized process parameters evidently minimized the surface defects of the film. In the condition of the target current of 16 A, the gases pressure of 0.31 Pa, and the bias voltages in a range of-120∼-240 V, an optimized Cr_xO_y film has been synthesized with surface defect density low to 78 defect/mm-2. © (2011) Trans Tech Publications, Switzerland.

Original language	English
Title of host publication	Materials Processing Technology
Pages	219-222
Volume	291-294
DOIs	https://doi.org/10.4028/www.scientific.net/AMR.291-294.219
Publication status	Published - 2011
Event	2011 International Conference on Advanced Engineering Materials and Technology (AEMT 2011) - Sanya, China Duration: 29 Jul 2011 → 31 Jul 2011

Publication series

Name	Advanced Materials Research
Volume	291-294
ISSN (Print)	1022-6680

Conference

Conference	2011 International Conference on Advanced Engineering Materials and Technology (AEMT 2011)
Place	China
City	Sanya
Period	29/07/11 → 31/07/11

Research Keywords

CrxOy film
Forming mechanism
Mid-frequency dual-magnetron sputtering
Surface defect

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Cite this

@inproceedings{98565ae6921d45fca95b66a07a8ef07d,

title = "Reducing surface defects of CrxOy film in mid-frequency dual-magnetron sputtering",

abstract = "Influence of the process parameters of a reactive mid-frequency dual-magnetron sputtering on surface defects of CrxOy film was investigated. The forming mechanisms of the observed droplets and craters were analyzed. The optimal parameter combination for accomplishing fewer surface defects was explored; and the optimized process parameters evidently minimized the surface defects of the film. In the condition of the target current of 16 A, the gases pressure of 0.31 Pa, and the bias voltages in a range of-120∼-240 V, an optimized CrxOy film has been synthesized with surface defect density low to 78 defect/mm-2. {\textcopyright} (2011) Trans Tech Publications, Switzerland.",

keywords = "CrxOy film, Forming mechanism, Mid-frequency dual-magnetron sputtering, Surface defect",

author = "Xiang Yu and Lei Ma and Yang Liu and Zhongzhou Yang and Meng Hua",

year = "2011",

doi = "10.4028/www.scientific.net/AMR.291-294.219",

language = "English",

isbn = "9783037851937",

volume = "291-294",

series = "Advanced Materials Research",

pages = "219--222",

booktitle = "Materials Processing Technology",

note = "2011 International Conference on Advanced Engineering Materials and Technology (AEMT 2011) ; Conference date: 29-07-2011 Through 31-07-2011",

}

Yu, X, Ma, L, Liu, Y, Yang, Z & Hua, M 2011, Reducing surface defects of Cr_xO_y film in mid-frequency dual-magnetron sputtering. in Materials Processing Technology. vol. 291-294, Advanced Materials Research, vol. 291-294, pp. 219-222, 2011 International Conference on Advanced Engineering Materials and Technology (AEMT 2011), Sanya, China, 29/07/11. https://doi.org/10.4028/www.scientific.net/AMR.291-294.219

Reducing surface defects of Cr_xO_y film in mid-frequency dual-magnetron sputtering. / Yu, Xiang; Ma, Lei; Liu, Yang et al.
Materials Processing Technology. Vol. 291-294 2011. p. 219-222 (Advanced Materials Research; Vol. 291-294).

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

TY - GEN

T1 - Reducing surface defects of CrxOy film in mid-frequency dual-magnetron sputtering

AU - Yu, Xiang

AU - Ma, Lei

AU - Liu, Yang

AU - Yang, Zhongzhou

AU - Hua, Meng

PY - 2011

Y1 - 2011

N2 - Influence of the process parameters of a reactive mid-frequency dual-magnetron sputtering on surface defects of CrxOy film was investigated. The forming mechanisms of the observed droplets and craters were analyzed. The optimal parameter combination for accomplishing fewer surface defects was explored; and the optimized process parameters evidently minimized the surface defects of the film. In the condition of the target current of 16 A, the gases pressure of 0.31 Pa, and the bias voltages in a range of-120∼-240 V, an optimized CrxOy film has been synthesized with surface defect density low to 78 defect/mm-2. © (2011) Trans Tech Publications, Switzerland.

AB - Influence of the process parameters of a reactive mid-frequency dual-magnetron sputtering on surface defects of CrxOy film was investigated. The forming mechanisms of the observed droplets and craters were analyzed. The optimal parameter combination for accomplishing fewer surface defects was explored; and the optimized process parameters evidently minimized the surface defects of the film. In the condition of the target current of 16 A, the gases pressure of 0.31 Pa, and the bias voltages in a range of-120∼-240 V, an optimized CrxOy film has been synthesized with surface defect density low to 78 defect/mm-2. © (2011) Trans Tech Publications, Switzerland.

KW - CrxOy film

KW - Forming mechanism

KW - Mid-frequency dual-magnetron sputtering

KW - Surface defect

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