Recursive Least Squares Estimation for Run-to-Run Control With Metrology Delay and Its Application to STI Etch Process

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Jin Wang
  • Q. Peter He
  • S. Joc Qin
  • Christopher A. Bode
  • Matthew A. Purdy

Detail(s)

Original languageEnglish
Pages (from-to)309-319
Journal / PublicationIEEE Transactions on Semiconductor Manufacturing
Volume18
Issue number2
Online published9 May 2005
Publication statusPublished - May 2005
Externally publishedYes

Abstract

Run-to-run (RtR) control technology has received tremendous interest in semiconductor manufacturing. Exponentially weighted moving average (EWMA), double-EWMA, and internal model control (IMC) filters are recognized methods for online RtR estimation. In this paper, we consider recursive least squares (RLS) as an alternative for online estimation and RtR control. The relationship between EWMA-type and RLS-type estimates is analyzed and verified with simulations. Because measurement delay is almost inevitable in semiconductor manufacturing, we discuss and compare the performance of EWMA, RtR-IMC, and RLS controllers in handling measurement delay and measurement noise for processes with a deterministic drift. An ad hoc solution is proposed to handle measurement delay for processes with time-varying drifts. The results are illustrated through several simulations and a shallow trench isolation (STI) etch process as an industrial example. © 2005 IEEE.

Research Area(s)

  • Double exponentially weighted moving average (EWMA), EWMA, Internal model control (IMC), Measurement delay, Recursive least squares (RLS), Run-to-run (RtR) control, Shallow trench isolation (STI)

Citation Format(s)

Recursive Least Squares Estimation for Run-to-Run Control With Metrology Delay and Its Application to STI Etch Process. / Wang, Jin; He, Q. Peter; Qin, S. Joc; Bode, Christopher A.; Purdy, Matthew A.

In: IEEE Transactions on Semiconductor Manufacturing, Vol. 18, No. 2, 05.2005, p. 309-319.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review