Real-time spectroscopic ellipsometry from 1.5 to 6.5 eV
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 16-21 |
Journal / Publication | Thin Solid Films |
Volume | 364 |
Issue number | 1 |
Publication status | Published - 27 Mar 2000 |
Externally published | Yes |
Conference
Title | The 1999 E-MRS Spring Conference, Symposium P: Optical Characterization of Semiconductor Layers and Surfaces |
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City | Strasbourg, France |
Period | 1 - 4 June 1999 |
Link(s)
Abstract
A rotating polarizer multichannel ellipsometer has been optimized for operation well into the ultraviolet (UV) spectral range. Key modifications to previous instrument designs include (i) a tandem in-line Xe/D2 source configuration for usable spectral output from 1.5 (827 nm) to 6.5 eV (191 nm), (ii) MgF2 Rochon polarizers for high transmission in the UV and (iii) a spectrograph with a grating blazed at 250 nm and two stages of internally-mounted order-sorting filters. The resulting multichannel ellipsometer provides 132 point spectra in the ellipsometric parameters (ψ, Δ) over the range from 1.5 to 6.5 eV with a minimum acquisition time of 24.5 ms. As an example of the application of this instrument, real-time spectroscopic ellipsometry (SE) is reported for the analysis of a hexagonal boron nitride thin film deposition by radio-frequency magnetron sputtering onto a silicon wafer substrate.
Citation Format(s)
Real-time spectroscopic ellipsometry from 1.5 to 6.5 eV. / Zapien, J. A.; Collins, R. W.; Messier, R.
In: Thin Solid Films, Vol. 364, No. 1, 27.03.2000, p. 16-21.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review