Real-time shape evolution of nanoimprinted polymer structures during thermal annealing

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Ronald L. Jones
  • Tengjiao Hu
  • Christopher L. Soles
  • Eric K. Lin
  • Ronald M. Reano
  • Diego M. Casa

Detail(s)

Original languageEnglish
Pages (from-to)1723-1728
Journal / PublicationNano Letters
Volume6
Issue number8
Publication statusPublished - Aug 2006
Externally publishedYes

Abstract

The real-time shape evolution of nanoimprinted polymer patterns is measured as a function of annealing time and temperature using critical dimension small-angle X-ray scattering (CD-SAXS). Periodicity, line width, line height, and sidewall angle are reported with nanometer resolution for parallel line/space patterns in poly(methyl methacrylate) (PMMA) both below and above the bulk glass transition temperature (T G). Heating these patterns below T G does not produce significant thermal expansion, at least to within the resolution of the measurement. However, above T G the fast rate of loss in pattern size at early times transitions to a reduced rate in longer time regimes. The time-dependent rate of polymer flow from the pattern into the underlying layer, termed pattern "melting", is consistent with a model of elastic recovery from stresses induced by the molding process. © 2006 American Chemical Society.

Citation Format(s)

Real-time shape evolution of nanoimprinted polymer structures during thermal annealing. / Jones, Ronald L.; Hu, Tengjiao; Soles, Christopher L.; Lin, Eric K.; Reano, Ronald M.; Pang, Stella W.; Casa, Diego M.

In: Nano Letters, Vol. 6, No. 8, 08.2006, p. 1723-1728.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review