Raman spectroscopy study of DLC films prepared by RF plasma and filtered cathodic arc

Peter C.T. Ha; D.R. McKenzie; M.M.M. Bilek; S.C.H. Kwok; P.K. Chu; B.K. Tay

doi:10.1016/j.surfcoat.2006.09.048

Raman spectroscopy study of DLC films prepared by RF plasma and filtered cathodic arc

Peter C.T. Ha^*, D.R. McKenzie, M.M.M. Bilek, S.C.H. Kwok, P.K. Chu, B.K. Tay

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

53 Citations (Scopus)

Abstract

The build-up of intrinsic stress in carbon thin films deposited by vapour deposition can be a major cause of delamination. Arguably, this issue has been one of the main reasons why the industrial exploitation of carbon vapour deposited films has so far been of limited success. In the present study we deposited single and multilayer thin films of carbon and found that under certain deposition conditions, we were able to produce thin films free from delamination. Single and multilayer of films Diamond-like Carbon (DLC) were prepared by Plasma Immersion Ion Implantation and Deposition (PIIID) from two deposition systems: (1) Radio-Frequency (RF) plasma and (2) Filtered Cathodic Vacuum Arc (FCVA). Raman spectroscopy revealed a shift in the peaks previously identified as D and G band in the structures. The sp² and sp³ ratio contents were characterized by Raman spectroscopy. © 2006 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	6734-6736
Journal	Surface and Coatings Technology
Volume	201
Issue number	15
DOIs	https://doi.org/10.1016/j.surfcoat.2006.09.048
Publication status	Published - 23 Apr 2007

Research Keywords

Diamond-like carbon
FCVA
Raman
RF

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title = "Raman spectroscopy study of DLC films prepared by RF plasma and filtered cathodic arc",

abstract = "The build-up of intrinsic stress in carbon thin films deposited by vapour deposition can be a major cause of delamination. Arguably, this issue has been one of the main reasons why the industrial exploitation of carbon vapour deposited films has so far been of limited success. In the present study we deposited single and multilayer thin films of carbon and found that under certain deposition conditions, we were able to produce thin films free from delamination. Single and multilayer of films Diamond-like Carbon (DLC) were prepared by Plasma Immersion Ion Implantation and Deposition (PIIID) from two deposition systems: (1) Radio-Frequency (RF) plasma and (2) Filtered Cathodic Vacuum Arc (FCVA). Raman spectroscopy revealed a shift in the peaks previously identified as D and G band in the structures. The sp2 and sp3 ratio contents were characterized by Raman spectroscopy. {\textcopyright} 2006 Elsevier B.V. All rights reserved.",

keywords = "Diamond-like carbon, FCVA, Raman, RF",

author = "Ha, {Peter C.T.} and D.R. McKenzie and M.M.M. Bilek and S.C.H. Kwok and P.K. Chu and B.K. Tay",

year = "2007",

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language = "English",

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TY - JOUR

T1 - Raman spectroscopy study of DLC films prepared by RF plasma and filtered cathodic arc

AU - Ha, Peter C.T.

AU - McKenzie, D.R.

AU - Bilek, M.M.M.

AU - Kwok, S.C.H.

AU - Chu, P.K.

AU - Tay, B.K.

PY - 2007/4/23

Y1 - 2007/4/23

N2 - The build-up of intrinsic stress in carbon thin films deposited by vapour deposition can be a major cause of delamination. Arguably, this issue has been one of the main reasons why the industrial exploitation of carbon vapour deposited films has so far been of limited success. In the present study we deposited single and multilayer thin films of carbon and found that under certain deposition conditions, we were able to produce thin films free from delamination. Single and multilayer of films Diamond-like Carbon (DLC) were prepared by Plasma Immersion Ion Implantation and Deposition (PIIID) from two deposition systems: (1) Radio-Frequency (RF) plasma and (2) Filtered Cathodic Vacuum Arc (FCVA). Raman spectroscopy revealed a shift in the peaks previously identified as D and G band in the structures. The sp2 and sp3 ratio contents were characterized by Raman spectroscopy. © 2006 Elsevier B.V. All rights reserved.

AB - The build-up of intrinsic stress in carbon thin films deposited by vapour deposition can be a major cause of delamination. Arguably, this issue has been one of the main reasons why the industrial exploitation of carbon vapour deposited films has so far been of limited success. In the present study we deposited single and multilayer thin films of carbon and found that under certain deposition conditions, we were able to produce thin films free from delamination. Single and multilayer of films Diamond-like Carbon (DLC) were prepared by Plasma Immersion Ion Implantation and Deposition (PIIID) from two deposition systems: (1) Radio-Frequency (RF) plasma and (2) Filtered Cathodic Vacuum Arc (FCVA). Raman spectroscopy revealed a shift in the peaks previously identified as D and G band in the structures. The sp2 and sp3 ratio contents were characterized by Raman spectroscopy. © 2006 Elsevier B.V. All rights reserved.

KW - Diamond-like carbon

KW - FCVA

KW - Raman

KW - RF

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UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-33847396524&origin=recordpage

U2 - 10.1016/j.surfcoat.2006.09.048

DO - 10.1016/j.surfcoat.2006.09.048

M3 - RGC 21 - Publication in refereed journal

SN - 0257-8972

VL - 201

SP - 6734

EP - 6736

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 15

ER -

Raman spectroscopy study of DLC films prepared by RF plasma and filtered cathodic arc

Abstract

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