Quantitative study of AFM-based nanopatterning of graphene nanoplate

Research output: Chapters, Conference Papers, Creative and Literary Works (RGC: 12, 32, 41, 45)32_Refereed conference paper (with ISBN/ISSN)peer-review

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Detail(s)

Original languageEnglish
Title of host publication14th IEEE International Conference on Nanotechnology, IEEE-NANO 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages54-57
ISBN (Print)9781479956227
Publication statusPublished - 26 Nov 2014

Conference

Title14th IEEE International Conference on Nanotechnology (IEEE-NANO 2014)
PlaceCanada
CityToronto
Period18 - 21 August 2014

Abstract

This paper presents a quantitative study of the patterning of graphene nanoplates using Atomic force microscopy (AFM) based nanolithography. Nanoscale trenches with controllable width and depth are created on graphene nanoplates by employing force-controlled nanomechanical cutting and voltage-controlled local anodic oxidation (LAO) technique, respectively. During the cutting process, the effect of the applied cutting force and LAO voltage on the dimension of trenches is quantitatively investigated. By applying the well-defined cutting parameters, graphene nanoribbons with desirable width can be fabricated effectively. In addition, the electric characteristic of the graphene nanoplate is measured, which shows that the electronic properties vary with the width of the graphene nanoribbons. This study provides an applicable way to realize high efficient, reliable, and accurate nanopatterning of graphene nanoplate.

Citation Format(s)

Quantitative study of AFM-based nanopatterning of graphene nanoplate. / Tang, Xin; Lai, King Wai Chiu.

14th IEEE International Conference on Nanotechnology, IEEE-NANO 2014. Institute of Electrical and Electronics Engineers Inc., 2014. p. 54-57 6968106.

Research output: Chapters, Conference Papers, Creative and Literary Works (RGC: 12, 32, 41, 45)32_Refereed conference paper (with ISBN/ISSN)peer-review