Optimized lift-off technique for deposition of high-quality Ti strip on LiNbO3 crystal
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Related Research Unit(s)
Detail(s)
Original language | English |
---|---|
Pages (from-to) | 283-285 |
Journal / Publication | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 22 |
Issue number | 1 |
Publication status | Published - Jan 2004 |
Link(s)
Abstract
A lift-off technique for deposition of Ti strips onto the surface of both Z-and X-cut LiNbO3 crystals was studied. Several pretreatments on the Ti-sputtered substrate were compared before carrying out the lift-off procedure to optimize the procedure. Preserving the Ti-sputtered substrate in a container at a temperature of 50-90 °C for a duration of several hours was found to be the best pretreatment. The pretreatment was found to strengthen the adhesion of the Ti metal onto the crystal surface to some extent and thereby allowed the obtaining of high quality Ti strips.
Citation Format(s)
Optimized lift-off technique for deposition of high-quality Ti strip on LiNbO3 crystal. / Zhang, De-Long; Wong, W. H.; Pun, E. Y B.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 22, No. 1, 01.2004, p. 283-285.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 22, No. 1, 01.2004, p. 283-285.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review