Optimized lift-off technique for deposition of high-quality Ti strip on LiNbO3 crystal

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Original languageEnglish
Pages (from-to)283-285
Journal / PublicationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number1
Publication statusPublished - Jan 2004

Abstract

A lift-off technique for deposition of Ti strips onto the surface of both Z-and X-cut LiNbO3 crystals was studied. Several pretreatments on the Ti-sputtered substrate were compared before carrying out the lift-off procedure to optimize the procedure. Preserving the Ti-sputtered substrate in a container at a temperature of 50-90 °C for a duration of several hours was found to be the best pretreatment. The pretreatment was found to strengthen the adhesion of the Ti metal onto the crystal surface to some extent and thereby allowed the obtaining of high quality Ti strips.

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