通过比较实测与计算所得整体材料纳米压入加载曲线及 Berkovich 压头的面积函数, 对已建立的 Berkovich 压头绝对钝化量的确定方法进行了实验验证. 在此基础上, 测定了蒸发镀制在 Si 单晶上三种不同膜厚 A1 膜的屈服强度和硬化指数. 并与拉伸分离法获得的结果进行了比较. 结果表明, 利用纳米压入加载曲线确定陶瓷基体上金属薄膜基本力学性能的方法是可行的.

By comparing the loading curve for bulk material and the cross section area of Berkovich indenter measured by experiments with those calculated by FEM, the validity of the method for determining the bluntness value of the indenter is examined. And then, the functional equations for obtaining the mechanical properties of metal films are employed to determine the yield strengths and hardening indices of A1 films deposited on Si substrate. Furthermore, the stress-strain curves of A1 films on Si substrate can be obtained in terms of the yield strengths and hardening indices. From the result of comparing one of above stress-strain curves of A1 films with that determined by a dissociated method of uniaxial tensile test with A1 film deposited on an A1 foil, it was shown that the method for obtaining the mechanical properties of metal films on ceramic substrate from nanoindentation loading curve is feasible.