Preparation of crystalline carbon nitride films on silicon substrate by chemical vapor deposition

H. K. Woo; Yafei Zhang; S. T. Lee; C. S. Lee; Y. W. Lam; K. W. Wong

doi:10.1016/s0925-9635(96)00615-2

Author(s)

H. K. Woo
Yafei Zhang
S. T. Lee
Y. W. Lam
K. W. Wong

Detail(s)

Original language	English
Pages (from-to)	635-639
Journal / Publication	Diamond and Related Materials
Volume	6
Issue number	5-7
Publication status	Published - Apr 1997

Link(s)

DOI	DOI https://doi.org/10.1016/s0925-9635(96)00615-2 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0000684060&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(c5fcf3dd-1d62-4e0b-837a-4850ea2feb0c).html

Abstract

Polycrystalline carbon nitride films have been deposited on Si(111) substrates by d.c. and r.f. plasma-assisted hot filament chemical vapor deposition using a mixture of NH₃, CH₄ and H₂. For films prepared by both methods, the X-ray diffraction peaks match those of the theoretical β-C₃N₄ structure, Raman scattering detects no diamond, graphite or amorphous carbon in the films. XPS analysis shows that both films contain mainly C-N, C=N, and C≡N bonding structures. The N to C concentration ratio in the d.c. and r.f. plasma-assisted films is estimated to be 0.36 and 0.16, respectively. © 1997 Elsevier Science S.A.

Research Area(s)

Crystalline carbon nitride, d.c./r.f. plasma, Hot filament chemical vapor deposition, Silicon substrate

SDG 7 - Affordable and Clean Energy

Citation Format(s)

[ RIS ] [ BibTeX ]

Preparation of crystalline carbon nitride films on silicon substrate by chemical vapor deposition. / Woo, H. K.; Zhang, Yafei; Lee, S. T. et al.
In: Diamond and Related Materials, Vol. 6, No. 5-7, 04.1997, p. 635-639.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Woo, HK, Zhang, Y, Lee, ST, Lee, CS, Lam, YW & Wong, KW 1997, 'Preparation of crystalline carbon nitride films on silicon substrate by chemical vapor deposition', Diamond and Related Materials, vol. 6, no. 5-7, pp. 635-639. https://doi.org/10.1016/s0925-9635(96)00615-2

Woo, H. K., Zhang, Y., Lee, S. T., Lee, C. S., Lam, Y. W., & Wong, K. W. (1997). Preparation of crystalline carbon nitride films on silicon substrate by chemical vapor deposition. Diamond and Related Materials, 6(5-7), 635-639. https://doi.org/10.1016/s0925-9635(96)00615-2

Woo HK, Zhang Y, Lee ST, Lee CS, Lam YW, Wong KW. Preparation of crystalline carbon nitride films on silicon substrate by chemical vapor deposition. Diamond and Related Materials. 1997 Apr;6(5-7):635-639. doi: 10.1016/s0925-9635(96)00615-2

Woo, H. K. ; Zhang, Yafei ; Lee, S. T. et al. / Preparation of crystalline carbon nitride films on silicon substrate by chemical vapor deposition. In: Diamond and Related Materials. 1997 ; Vol. 6, No. 5-7. pp. 635-639.