Refractive index profile in photorefractive-damage-resistant near-stoichiometric Ti:Mg:Er : LiNbO 3 strip waveguide

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Author(s)

  • Shi-Yu Xu
  • Bei Chen
  • Ping-Rang Hua
  • Dao-Yin Yu
  • De-Long Zhang

Related Research Unit(s)

Detail(s)

Original languageEnglish
Article number6297432
Pages (from-to)1823-1830
Journal / PublicationIEEE Photonics Journal
Volume4
Issue number5
Publication statusPublished - 2012

Abstract

Refractive index profile in photorefractive-damage-resistant near-stoichiometric (NS) single-mode Ti:Mg:Er: LiNbO 3 strip waveguide is constructed from the measured mode field distribution. Like the conventional congruent Ti:LiNbO 3 waveguide, the Ti-induced refractive index increase in the NS waveguide studied here follows a sum of two error functions in the width direction and a Gaussian function in the depth direction. Based upon the established index profile model, the mode sizes were calculated using the variational method and compared with the experimental results. The Ti-induced index increment at the NS waveguide surface was also evaluated according to the empirical relation previously reported for the conventional congruent Ti: LiNbO 3 waveguide and compared with the data deduced from the mode field distribution. All comparisons show good agreement, showing that the index model proposed is close to the practical scenario. © 2009-2012 IEEE.

Research Area(s)

  • mode field distribution, Near-stoichiometric (NS) Ti:Mg:Er:LiNbO 3 waveguide, refractive index profile, variational method

Citation Format(s)

Refractive index profile in photorefractive-damage-resistant near-stoichiometric Ti:Mg:Er: LiNbO 3 strip waveguide. / Xu, Shi-Yu; Chen, Bei; Hua, Ping-Rang et al.
In: IEEE Photonics Journal, Vol. 4, No. 5, 6297432, 2012, p. 1823-1830.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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