Interaction between chromium oxide and chromium silicide

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

7 Scopus Citations
Scopus Metrics
View graph of relations

Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)258-259
Journal / PublicationJournal of Applied Physics
Volume54
Issue number1
Publication statusPublished - 1 Jan 1983
Externally publishedYes

Link(s)

DOI

DOI
Check@CityULib
Link to Scopus https://www.scopus.com/record/display.uri?eid=2-s2.0-0020497984&origin=recordpage
Permanent Link https://scholars.cityu.edu.hk/en/publications/publication(b74091e7-d5ec-4dbd-a3d7-84932afaff02).html

Abstract

We have used x-ray induced photoemission spectroscopy and Rutherford backscattering spectroscopy to study the chemical reaction between Cr2O3 and CrSi2. We observed that upon annealing a Cr film on a Si substrate at 550 °C to form CrSi2, the native chromium surface oxide will decompose while a film of SiO2 will form when the CrSi2 growth front reaches the Cr2O3.

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

Fingerprint

Publication fingerprints text

100
Chromium Oxide Keyphrases
100
CrSi2 Keyphrases
100
Chromium Silicide Keyphrases
100
interactions INIS
100
films INIS
100
chromium oxides INIS
100
chromium silicides INIS
100
Chromium Material Science
100
Oxide Compound Material Science
100
Silicide Material Science
Full Fingerprint ›

Citation Format(s)

[ RIS ] [ BibTeX ]
Interaction between chromium oxide and chromium silicide. / Cros, A.; Pollak, R. A.; Tu, K. N.
In: Journal of Applied Physics, Vol. 54, No. 1, 01.01.1983, p. 258-259.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review