Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principle

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Chi Chen
  • Ilsin An
  • G. M. Ferreira
  • N. J. Podraza
  • R. W. Collins

Detail(s)

Original languageEnglish
Pages (from-to)14-23
Journal / PublicationThin Solid Films
Volume455-456
Publication statusPublished - 1 May 2004
Externally publishedYes

Conference

TitleThe 3rd International Conference on Spectroscopic Ellipsometry
PlaceAustria
CityVienna
Period6 - 11 July 2003

Abstract

A multichannel ellipsometer in the dual rotating-compensator configuration has been designed and constructed for applications in real time Mueller matrix ellipsometry (approx. 2-5 eV) of anisotropic surfaces and films. The sequence of optical elements for this instrument is denoted PC1r1)SC2r2)A, where P, S, and A represent the polarizer, sample, and analyzer. C 1r1) and C2r2) represent two MgF2 biplate compensators that rotate at frequencies of ω1/2π=10 Hz and ω2/2π=6 Hz, synchronized for a ratio ω12 of 5:3. Spectra in the 16 Mueller matrix elements of a transmitting or reflecting sample can be established from the 25 non-zero Fourier coefficients of the irradiance waveform acquired in a single 0.25 s optical cycle. Initial high speed Mueller matrix measurements have been performed on weakly anisotropic samples that push the instrument to its precision/accuracy limits. These include the (110) Si surface with maximum cross-polarization ellipsometric angles of ψps∼0.1° and nanostructured thin films with maximum ψps∼1°. © 2003 Elsevier B.V. All rights reserved.

Research Area(s)

  • Data reduction, Dual-rotating compensator ellipsometer, Ellipsometer calibration, Multichannel Mueller matrix ellipsometry, Optical anisotropy

Citation Format(s)

Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principle. / Chen, Chi; An, Ilsin; Ferreira, G. M.; Podraza, N. J.; Zapien, J. A.; Collins, R. W.

In: Thin Solid Films, Vol. 455-456, 01.05.2004, p. 14-23.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review