Near-stoichiometric Ti-diffused LiNbO3 strip waveguide doped with Zr4+

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • De-Long Zhang
  • Xiao-Fei Yang
  • Qun Zhang
  • Wing-Han Wong
  • Dao-Yin Yu

Detail(s)

Original languageEnglish
Pages (from-to)5307-5310
Journal / PublicationOptics Letters
Volume40
Issue number22
Publication statusPublished - 15 Nov 2015

Abstract

We report a near-stoichiometric Ti:Zr:LiNbO3 strip waveguide fabricated from a congruent substrate with a technological process in the following sequence: Zr4+-diffusion-doping, diffusion of 8-μm-wide, 100-nm-thick Ti strips, and post-Li-rich vapor transport equilibration. We show that Zr4+-doping has little effect on the LiNbO3-refractive index, and the waveguide is in a near-stoichiomet ric environment. The waveguide well supports both the TE and TM modes, shows weak polarization dependence, is in single mode at the 1.5 μm wavelength, and has a loss of ≤0.6/0.8 dB/cm for the TE/TM modes. A secondary ion mass spectrometry analysis shows that the Zr4+-profile part with a concentration above the threshold of photorefractive damage entirely covers the waveguide, implying that the waveguide would be optical-damage resistant.

Citation Format(s)

Near-stoichiometric Ti-diffused LiNbO3 strip waveguide doped with Zr4+. / Zhang, De-Long; Yang, Xiao-Fei; Zhang, Qun; Wong, Wing-Han; Yu, Dao-Yin; Pun, Edwin Yue-Bun.

In: Optics Letters, Vol. 40, No. 22, 15.11.2015, p. 5307-5310.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review