Thermodynamic Study on Diffusion Growth of Ga3+-Doped LiNbO3 Single Crystal Thin Film for Photonic Application
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
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Detail(s)
Original language | English |
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Pages (from-to) | 1300-1305 |
Journal / Publication | Crystal Growth and Design |
Volume | 16 |
Issue number | 3 |
Publication status | Published - 2 Mar 2016 |
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Abstract
A thermodynamic study was performed on the growth of Ga3+-doped LiNbO3 (LN) thin film. Some Ga3+-doped LN thin films were grown on the LN surface by thermal diffusion of Ga2O3 film in the temperature range of 1000-1100 °C. After growth, the Ga3+ ion in the grown thin film was profiled, and its diffusion-growth characteristics were studied. The temperature dependences of diffusion-growth coefficient and solubility were quantified. These dependences are crucial to the design and growth of a Ga3+-doped LN thin film for various photonic applications. A comparison with the case of Ti4+ diffusion-growth, which induces an increase of LN refractive index and hence formation of an optical waveguide, shows that Ga3+ grows considerably faster than Ti4+ because of its smaller ionic radius. In addition, Ga3+-doping contribution to LN refractive index was studied by measuring and comparing the refractive indices at Ga3+-grown and Ga3+-free parts of the crystal surface. The results show that the contribution is small.
Citation Format(s)
Thermodynamic Study on Diffusion Growth of Ga3+-Doped LiNbO3 Single Crystal Thin Film for Photonic Application. / Zhang, De-Long; Zhang, Qun; Kang, Jian et al.
In: Crystal Growth and Design, Vol. 16, No. 3, 02.03.2016, p. 1300-1305.
In: Crystal Growth and Design, Vol. 16, No. 3, 02.03.2016, p. 1300-1305.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review