Area-Selective Atomic Layer Deposition : Conformal Coating, Subnanometer Thickness Control and Smart Positioning
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
| Original language | English |
|---|---|
| Pages (from-to) | 8651-8654 |
| Journal / Publication | ACS Nano |
| Volume | 9 |
| Publication status | Published - 2015 |
Link(s)
| Permanent Link | https://scholars.cityu.edu.hk/en/publications/publication(978dfd0c-e9af-4a69-a02b-e90689038960).html |
|---|
Citation Format(s)
Area-Selective Atomic Layer Deposition : Conformal Coating, Subnanometer Thickness Control and Smart Positioning. / FANG, Ming; HO, Johnny Chung Yin.
In: ACS Nano, Vol. 9, 2015, p. 8651-8654.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
