Biomedical properties of tantalum nitride films synthesized by reactive magnetron sputtering

Y. X. Leng; H. Sun; P. Yang; J. Y. Chen; J. Wang; G. J. Wan; N. Huang; X. B. Tian; L. P. Wang; P. K. Chu

doi:10.1016/S0040-6090(01)01448-1

Author(s)

Y. X. Leng
H. Sun
P. Yang
J. Y. Chen
J. Wang
G. J. Wan
N. Huang
X. B. Tian
L. P. Wang

Detail(s)

Original language	English
Pages (from-to)	471-475
Journal / Publication	Thin Solid Films
Volume	398-399
Publication status	Published - Nov 2001

Conference

Title	28th International Conference on Metallurgia
Place	United States
City	San Diego,CA
Period	30 April - 30 May 2001

Link(s)

DOI	DOI https://doi.org/10.1016/S0040-6090(01)01448-1 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0035509051&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(784256bb-d340-46cc-983d-dd4dbc5828df).html

Abstract

The biomedical properties of tantalum nitride thin films synthesized by reactive magnetron sputtering employing orthogonal design technology are investigated. The adhesion properties between the film and substrate can be enhanced by optimizing the sputtering gas pressure and substrate temperature. The hardness of the tantalum nitride films is greatly affected by the nitrogen partial pressure, and our results show that films deposited under the optimal conditions can achieve a hardness value of approximately 40 GPa. The blood compatibility of the tantalum nitride films, as evaluated by clotting time measurement and platelet adhesion tests, is compared to that of TiN, Ta and low-temperature isotropic pyrolytic carbon (LTIC). Our data reveal that the blood compatibility of our tantalum nitride films is better, and tantalum nitride is thus an excellent material for the fabrication of commercial artificial heart valves. © 2001 Elsevier Science B.V. All rights reserved.

Research Area(s)

Artificial heart valve, Blood compatibility, Low-temperature isotropic pyrolytic carbon, Mechanical properties, Platelet adhesion, Tantalum nitride

Citation Format(s)

[ RIS ] [ BibTeX ]

Biomedical properties of tantalum nitride films synthesized by reactive magnetron sputtering. / Leng, Y. X.; Sun, H.; Yang, P.; Chen, J. Y.; Wang, J.; Wan, G. J.; Huang, N.; Tian, X. B.; Wang, L. P.; Chu, P. K.

In: Thin Solid Films, Vol. 398-399, 11.2001, p. 471-475.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

Leng, YX, Sun, H, Yang, P, Chen, JY, Wang, J, Wan, GJ, Huang, N, Tian, XB, Wang, LP & Chu, PK 2001, 'Biomedical properties of tantalum nitride films synthesized by reactive magnetron sputtering', Thin Solid Films, vol. 398-399, pp. 471-475. https://doi.org/10.1016/S0040-6090(01)01448-1

Leng, Y. X., Sun, H., Yang, P., Chen, J. Y., Wang, J., Wan, G. J., Huang, N., Tian, X. B., Wang, L. P., & Chu, P. K. (2001). Biomedical properties of tantalum nitride films synthesized by reactive magnetron sputtering. Thin Solid Films, 398-399, 471-475. https://doi.org/10.1016/S0040-6090(01)01448-1

Leng YX, Sun H, Yang P, Chen JY, Wang J, Wan GJ et al. Biomedical properties of tantalum nitride films synthesized by reactive magnetron sputtering. Thin Solid Films. 2001 Nov;398-399:471-475. https://doi.org/10.1016/S0040-6090(01)01448-1

Leng, Y. X. ; Sun, H. ; Yang, P. ; Chen, J. Y. ; Wang, J. ; Wan, G. J. ; Huang, N. ; Tian, X. B. ; Wang, L. P. ; Chu, P. K. / Biomedical properties of tantalum nitride films synthesized by reactive magnetron sputtering. In: Thin Solid Films. 2001 ; Vol. 398-399. pp. 471-475.