Thermal-Piezoresistive Tuning of the Effective Quality Factor of a Micromechanical Resonator

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • James M.Lehto Miller
  • Haoshen Zhu
  • David B. Heinz
  • Yunhan Chen
  • Ian B. Flader
  • Dongsuk D. Shin
  • Thomas W. Kenny

Detail(s)

Original languageEnglish
Article number044055
Journal / PublicationPhysical Review Applied
Volume10
Issue number4
Online published23 Oct 2018
Publication statusPublished - Oct 2018

Link(s)

Abstract

We study the thermal-piezoresistive pumping mechanism within silicon micromechanical resonators. We develop a multiphysics finite-element model to predict the effective quality factor tuning from pumping for arbitrary geometries and dopants. Our model reproduces the effective quality factor tuning direction and magnitude of our fabricated devices versus direct current as a function of dopant type, concentration, thermal actuator width, and device orientation. We show that, in contrast to degenerate parametric amplification, thermal pumping steepens the phase slope near resonance with an increasing effective quality factor.

Research Area(s)

Citation Format(s)

Thermal-Piezoresistive Tuning of the Effective Quality Factor of a Micromechanical Resonator. / Miller, James M.Lehto; Zhu, Haoshen; Heinz, David B. et al.

In: Physical Review Applied, Vol. 10, No. 4, 044055, 10.2018.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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