Improved microyield strength in beryllium produced by vapor deposition

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Original languageEnglish
Pages (from-to)863-868
Journal / PublicationScripta Materialia
Issue number6
Publication statusPublished - 13 Feb 1998
Externally publishedYes


Thick Be deposits were produced by vapor deposition at a substrate temperature of 400°C. Deposits were prepared from both stationary and rotating substrates. In the case of a stationary substrate, the microstructure of the deposit consisted of columnar grains with their major axis parallel to the direction of incidence of the depositing atoms. By contrast, a rotating substrate produced deposits with a microstructure consisting of helical columnar grains. This helical grained structure results in a significant improvement in microyield strength; the microyield strengths for deposits produced from stationary and rotating substrates are 57.3 and 213.5 MPa, respectively. The improved microyield strength is proposed to be a result of the presence of geometrically necessary dislocations in the deposit produced from a rotating substrate.

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