Simultaneous Removal of Antibiotic Resistant Bacteria, Antibiotic Resistance Genes, and Micropollutants by FeS2@GO-Based Heterogeneous Photo-Fenton Process

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Author(s)

  • Yunus Ahmed
  • Jiexi Zhong
  • Zhiliang Wang
  • Lianzhou Wang
  • Jianhua Guo

Detail(s)

Original languageEnglish
Pages (from-to)15156-15166
Journal / PublicationEnvironmental Science and Technology
Volume56
Issue number21
Online published27 Jun 2022
Publication statusPublished - 1 Nov 2022
Externally publishedYes

Abstract

The co-occurrence of various chemical and biological contaminants of emerging concerns has hindered the application of water recycling. This study aims to develop a heterogeneous photo-Fenton treatment by fabricating nano pyrite (FeS2) on graphene oxide (FeS2@GO) to simultaneously remove antibiotic resistant bacteria (ARB), antibiotic resistance genes (ARGs), and micropollutants (MPs). A facile and solvothermal process was used to synthesize new pyrite-based composites. The GO coated layer forms a strong chemical bond with nano pyrite, which enables to prevent the oxidation and photocorrosion of pyrite and promote the transfer of charge carriers. Low reagent doses of FeS2@GO catalyst (0.25 mg/L) and H2O2 (1.0 mM) were found to be efficient for removing 6-log of ARB and 7-log of extracellular ARG (e-ARG) after 30 and 7.5 min treatment, respectively, in synthetic wastewater. Bacterial regrowth was not observed even after a two-day incubation. Moreover, four recalcitrant MPs (sulfamethoxazole, carbamazepine, diclofenac, and mecoprop at an environmentally relevant concentration of 10 μg/L each) were completely removed after 10 min of treatment. The stable and recyclable composite generated more reactive species, including hydroxyl radicals (HO), superoxide radicals (O2-), singlet oxygen (1O2). These findings highlight that the synthesized FeS2@GO catalyst is a promising heterogeneous photo-Fenton catalyst for the removal of emerging contaminants. © 2022 American Chemical Society.

Research Area(s)

  • antibiotic resistance genes (ARGs), antibiotic resistant bacteria (ARB), emerging contaminants (EC), FeS2, GO, heterogeneous photo-Fenton, micropollutants (MPs)

Citation Format(s)

Simultaneous Removal of Antibiotic Resistant Bacteria, Antibiotic Resistance Genes, and Micropollutants by FeS2@GO-Based Heterogeneous Photo-Fenton Process. / Ahmed, Yunus; Zhong, Jiexi; Wang, Zhiliang et al.
In: Environmental Science and Technology, Vol. 56, No. 21, 01.11.2022, p. 15156-15166.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review