Response to "Comment on 'Effect of current crowding on vacancy diffusion and void formation in electromigration'" [Appl. Phys. Lett. 79, 1061 (2001)]

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)Comment/debate

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Original languageEnglish
Journal / PublicationApplied Physics Letters
Issue number7
Publication statusPublished - 13 Aug 2001
Externally publishedYes

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