Optical-damage-resistant MgO-diffused near-stoichiometric Ti : LiNbO 3 strip waveguides

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

5 Scopus Citations
View graph of relations

Author(s)

  • Ping-Rang Hua
  • Shuai Zhang
  • Na Dong
  • Dao-Yin Yu
  • De-Long Zhang

Related Research Unit(s)

Detail(s)

Original languageEnglish
Article number6151037
Pages (from-to)491-493
Journal / PublicationIEEE Photonics Technology Letters
Volume24
Issue number6
Publication statusPublished - 2012

Abstract

We report near-stoichiometric (NS) Ti:Mg:LiNbO 3 strip waveguides fabricated starting from a Z-cut pure congruent LiNbO3 substrate in sequence by Ti- and MgO-diffusion and post vapor transport equilibration. These waveguides with an initial Ti-strip width of 4-8 μm well support transverse magnetic mode, are single-mode at 0.98- and 1.5-μm wavelengths, have a smooth surface and a loss as low as 0.1 dB/cm at 1.5 μm. The waveguides are NS and optical-damage-resistant, and have a homogeneous Mg concentration of 1.7 ± 0.3 mol% in the guiding layer. Such a waveguide is promising for nonlinear integrated optics. © 2011 IEEE.

Research Area(s)

  • MgO-diffusion, Near-stoichiometric (NS) Ti:Mg:LiNbO 3 waveguide, Photorefractive effect

Citation Format(s)

Optical-damage-resistant MgO-diffused near-stoichiometric Ti: LiNbO 3 strip waveguides. / Hua, Ping-Rang; Zhang, Shuai; Dong, Na et al.
In: IEEE Photonics Technology Letters, Vol. 24, No. 6, 6151037, 2012, p. 491-493.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review