Laterally Stitched Heterostructures of Transition Metal Dichalcogenide : Chemical Vapor Deposition Growth on Lithographically Patterned Area

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Author(s)

  • Henan Li
  • Peng Li
  • Ming-Yang Li
  • Chih-Wen Yang
  • Yumeng Shi
  • Xi-Xiang Zhang
  • Lain-Jong Li

Detail(s)

Original languageEnglish
Pages (from-to)10516-10523
Journal / PublicationACS Nano
Volume10
Issue number11
Publication statusPublished - 22 Nov 2016
Externally publishedYes

Abstract

Two-dimensional transition metal dichalcogenides (TMDCs) have shown great promise in electronics and optoelectronics due to their unique electrical and optical properties. Heterostructured TMDC layers such as the laterally stitched TMDCs offer the advantages of better electronic contact and easier band offset tuning. Here, we demonstrate a photoresist-free focused ion beam (FIB) method to pattern as-grown TMDC monolayers by chemical vapor deposition, where the exposed edges from FIB etching serve as the seeds for growing a second TMDC material to form desired lateral heterostructures with arbitrary layouts. The proposed lithographic and growth processes offer better controllability for fabrication of the TMDC heterostrucuture, which enables the construction of devices based on heterostructural monolayers. © 2016 American Chemical Society.

Research Area(s)

  • chemical vapor deposition, heterostructure, transition metal dichalcogenides, two-dimensional materials

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.

Citation Format(s)

Laterally Stitched Heterostructures of Transition Metal Dichalcogenide: Chemical Vapor Deposition Growth on Lithographically Patterned Area. / Li, Henan; Li, Peng; Huang, Jing-Kai et al.
In: ACS Nano, Vol. 10, No. 11, 22.11.2016, p. 10516-10523.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review