Silicide films for archival optical storage
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
| Original language | English |
|---|---|
| Pages (from-to) | 927-929 |
| Journal / Publication | Applied Physics Letters |
| Volume | 39 |
| Issue number | 11 |
| Publication status | Published - 1981 |
| Externally published | Yes |
Link(s)
Abstract
We demonstrate here that bilayer films consisting of Si and transition metals with a layer thickness of 15-40 nm are promising materials for archival optical storage. They show a large optical reflectivity change before and after silicide formation, have a long lifetime at room temperature, and are nontoxic.
Bibliographic Note
Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.
Citation Format(s)
Silicide films for archival optical storage. / Tu, K. N.; Ahn, K. Y.; Herd, S. R.
In: Applied Physics Letters, Vol. 39, No. 11, 1981, p. 927-929.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
