Enhanced discharge and surface properties of TiSiCN coatings deposited by pulse-enhanced vacuum arc evaporation

Pulse-enhanced vacuum arc evaporation (PEVAE), an advanced version of conventional DC vacuum arc evaporation, generates a high flux of electrons to ionize more gaseous and metallic atoms in the deposition system to facilitate coating deposition. Compared to the conventional DC mode, the highly ionized plasma improves the structure and properties of the coatings deposited by the PEVAE mode. To obtain a better understanding and evaluate the advantages and limitations of this technique, we conduct a comparative study on TiSiCN coatings deposited by the traditional DC mode and PEVAE mode for different target-to-substrate distances (D_t-s) in the reactive environment of HMDSN. The substrate current is determined by an oscilloscope and optical emission is monitored by a miniature fiber-optics spectrometer. The microstructure and properties of the coatings are characterized by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, indentation test, nanoindentation, electrochemical measurement, and ball-on-disk wear test. The results demonstrate that the average substrate current increases by 53.8% as D_t-s increases from 200 mm to 300 mm. The pulsed current discharge in the HMDSN atmosphere increases the deposition rates by up to 36.4% and E_bi increases by 29% reflecting a denser microstructure. The PEVAE mode improves the microstructure of the TiSiCN coatings as well as resistance to corrosion and wear. Furthermore, it has good processing adaptability for different target-to-substrate distances.