Resistance Distances In Simplicial Networks

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Detail(s)

Original languageEnglish
Article numberbxac052
Pages (from-to)1922–1935
Number of pages14
Journal / PublicationComputer Journal
Volume66
Issue number8
Online published23 Apr 2022
Publication statusPublished - Aug 2023

Abstract

It is well known that in many real networks, such as brain networks and scientific collaboration networks, there exist higher order nonpairwise relations among nodes, i.e. interactions between more than two nodes at a time. This simplicial structure can be described by simplicial complexes and has an important effect on topological and dynamical properties of networks involving such group interactions. In this paper, we study analytically resistance distances in iteratively growing networks with higher order interactions characterized by the simplicial structure that is controlled by a parameter q. We derive exact formulas for interesting quantities about resistance distances, including Kirchhoff index, additive degree-Kirchhoff index, multiplicative degree-Kirchhoff index, as well as average resistance distance, which have found applications in various areas elsewhere. We show that the average resistance distance tends to a q-dependent constant, indicating the impact of simplicial organization on the structural robustness measured by average resistance distance.

Research Area(s)

  • Effective resistance, Kirchhoff index, simplicial network, simplicial complex, higher order organization, scale-free network, KEMENYS CONSTANT, CONSENSUS, COHERENCE, DYNAMICS, GRAPHS

Citation Format(s)

Resistance Distances In Simplicial Networks. / ZHU, Mingzhe; XU, Wanyue; ZHANG, Zhongzhi et al.
In: Computer Journal, Vol. 66, No. 8, bxac052, 08.2023, p. 1922–1935.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review