Recent developments and applications of plasma immersion ion implantation

Paul K. Chu

doi:10.1116/1.1632920

Author(s)

Paul K. Chu

Detail(s)

Original language	English
Pages (from-to)	289-296
Journal / Publication	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	22
Issue number	1
Publication status	Published - Jan 2004

Link(s)

DOI	DOI https://doi.org/10.1116/1.1632920 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-1642338574&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(0addc37e-43d6-4741-9d58-8948255841fe).html

Abstract

The latest developments and applications of plasma immersion ion implantation (PIII) in semiconductors and nonsemiconductors are described. Plasma doping, which is a potential alternative to conventional beamline ion implantation in trench doping and shallow junction formation, is discussed. Another technique, the hydrogen PIII, which is used in the layer transfer technology, has gained acceptance with improved ion dose and energy uniformity as well as contamination control. The direct current PIII for planar sample processing, PIII for insulating materials and plasma surface modification of biomaterials are also presented.

Citation Format(s)

[ RIS ] [ BibTeX ]

Recent developments and applications of plasma immersion ion implantation. / Chu, Paul K.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 22, No. 1, 01.2004, p. 289-296.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Chu, PK 2004, 'Recent developments and applications of plasma immersion ion implantation', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 22, no. 1, pp. 289-296. https://doi.org/10.1116/1.1632920

Chu, P. K. (2004). Recent developments and applications of plasma immersion ion implantation. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 22(1), 289-296. https://doi.org/10.1116/1.1632920

Chu PK. Recent developments and applications of plasma immersion ion implantation. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2004 Jan;22(1):289-296. doi: 10.1116/1.1632920

Chu, Paul K. / Recent developments and applications of plasma immersion ion implantation. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2004 ; Vol. 22, No. 1. pp. 289-296.