Trilayered MoS2 Metal–Semiconductor–Metal Photodetectors : Photogain and Radiation Resistance
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Article number | 3800206 |
Journal / Publication | IEEE Journal on Selected Topics in Quantum Electronics |
Volume | 20 |
Issue number | 1 |
Online published | 9 Jul 2013 |
Publication status | Published - Jan 2014 |
Externally published | Yes |
Link(s)
Abstract
Trilayered MoS2 metal-semiconductor-metal (MSM) photodetectors (PDs) exhibit the photogain is up to 24 with high responsivity (∼1.04 A/W). This is because photocarriers generated at the MoS2 between two Au electrodes drift toward the metal-semiconductor interfaces due to band bending under applied bias and are then trapped at the surface state sites at the Au/MoS2 interfaces, giving rise to the decrease in Schottky barrier height. Moreover, MoS2 MSM PDs show fast operation speed; as the contact spacing reduces from 8 to 4 μm, the rise time and fall time of PDs reduce from 70 to 40 μs and from 110 to 50 μs, respectively. Trilayered MoS2 MSM PDs can operate even after 2-MeV proton illumination with ∼1011 cm-2 fluences, indicating the high radiation tolerance. This work demonstrates that trilayer MoS2 opens up a new dimension for 2-D nanomaterial applications in harsh electronics.
Research Area(s)
- Graphene, harsh environment, MoS2, photodetector, Radiation resistance
Citation Format(s)
Trilayered MoS2 Metal–Semiconductor–Metal Photodetectors: Photogain and Radiation Resistance. / Tsai, Dung-Sheng; Lien, Der-Hsien; Tsai, Meng-Lin et al.
In: IEEE Journal on Selected Topics in Quantum Electronics, Vol. 20, No. 1, 3800206, 01.2014.
In: IEEE Journal on Selected Topics in Quantum Electronics, Vol. 20, No. 1, 3800206, 01.2014.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review