Trilayered MoS2 Metal–Semiconductor–Metal Photodetectors : Photogain and Radiation Resistance

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Author(s)

  • Dung-Sheng Tsai
  • Der-Hsien Lien
  • Meng-Lin Tsai
  • Sheng-Han Su
  • Kuan-Ming Chen
  • Jr-Jian Ke
  • Yueh-Chung Yu
  • Lain-Jong Li

Detail(s)

Original languageEnglish
Article number3800206
Journal / PublicationIEEE Journal on Selected Topics in Quantum Electronics
Volume20
Issue number1
Online published9 Jul 2013
Publication statusPublished - Jan 2014
Externally publishedYes

Abstract

Trilayered MoS2 metal-semiconductor-metal (MSM) photodetectors (PDs) exhibit the photogain is up to 24 with high responsivity (∼1.04 A/W). This is because photocarriers generated at the MoS2 between two Au electrodes drift toward the metal-semiconductor interfaces due to band bending under applied bias and are then trapped at the surface state sites at the Au/MoS2 interfaces, giving rise to the decrease in Schottky barrier height. Moreover, MoS2 MSM PDs show fast operation speed; as the contact spacing reduces from 8 to 4 μm, the rise time and fall time of PDs reduce from 70 to 40 μs and from 110 to 50 μs, respectively. Trilayered MoS2 MSM PDs can operate even after 2-MeV proton illumination with ∼1011 cm-2 fluences, indicating the high radiation tolerance. This work demonstrates that trilayer MoS2 opens up a new dimension for 2-D nanomaterial applications in harsh electronics.

Research Area(s)

  • Graphene, harsh environment, MoS2, photodetector, Radiation resistance

Citation Format(s)

Trilayered MoS2 Metal–Semiconductor–Metal Photodetectors: Photogain and Radiation Resistance. / Tsai, Dung-Sheng; Lien, Der-Hsien; Tsai, Meng-Lin et al.
In: IEEE Journal on Selected Topics in Quantum Electronics, Vol. 20, No. 1, 3800206, 01.2014.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review